Some By Mi Retinol Intense Reactivating Mask

Dette intensiv Sheet mask reducerer fine linjer og genopretter elasticitet  og fasthed i huden. Masken er formuleret med en masser af aktive ingredienser som retinal, retinol, bakuchiol, 10 forskellige hyaluronsyre, tea tree og Centella Asiatica, som både virker ekstremt fugtgivende, fremmer cellefornyelse og stimulere kollagen produktionen samt virker beroligende. Efterlader huden glød og ungdommelig.

Anvendelse: Påfør masken på ny afrenset hud, lad det virker 20 min. Fjern derefter masken og masser essencen ind i huden.

Ingredienser: Water, Dipropylene Glycol, Hydrogenated Polydecene, Niacinamide, Dicaprylyl Ether, Melaleuca Alternifolia (Tea Tree) Leaf Extract, Centella Asiatica Root Extract, Centella Asiatica Leaf Extract, Centella Asiatica Extract, Artemisia Capillaris Extract, Olea Europaea (Olive) Fruit Oil, Sodium Hyaluronate, Hydrogenated Lecithin, Beta-Glucan, Cetearyl Olivate, Sorbitan Olivate, Glycerin, Xanthan Gum, Sodium Stearoyl Glutamate, Trehalose, Acrylates/C10-30 Alkyl Acrylate Crosspolymer, Tromethamine, Adenosine, Disodium EDTA, Betaine, Squalane, Tocopherol, Butylene Glycol, Caprylic/Capric Triglyceride, Dimethylsilanol Hyaluronate, Hydrolyzed Sodium Hyaluronate, Hydrolyzed Hyaluronic Acid, Glucose, Glutathione, Panthenol, Potassium Hyaluronate, Hyaluronic Acid, Saccharomyces Ferment, Sodium Hyaluronate Crosspolymer, Hydroxypropyltrimonium Hyaluronate, Sodium Hyaluronate Dimethylsilanol, Sodium Acetylated Hyaluronate, Glyceryl Polymethacrylate, Retinol (10 ppb), Retinal, Madecassoside, Bakuchiol, Asiaticoside, Dextrin, Madecassic Acid, BHA, BHT, Ceramide NP, Sucrose Distearate, Asiatic Acid, Palmitoyl Tripeptide-1, Propylene Glycol, 1,2-Hexanediol, Polysorbate 20, Fragrance, Hydroxyacetophenone, Ethylhexylglycerin